Dr. Vivek Bakshi is the founder and president of EUV Litho, Inc., an organization he formed in 2007 to promote EUV Lithography via consulting, workshops and education. He provides consulting services in the areas of EUV lithography (EUVL) and general lithography to investors, funding agencies, universities, national labs and suppliers. He also organizes the annual International Workshop on EUV Lithography (EUVL Workshop) and annual International Workshop on EUV and Soft X-ray Sources (Source Workshop). He also teaches EUVL short courses around the world. Dr. Bakshi is an Adjunct Professor in the School of Physics, University College Dublin, Ireland. He is a member of the Editorial board and Associate Editor of JM3 (SPIE Journal of Micro/Nano Lithography, MEMS and MOEMS). He frequently blogs about EUVL and his latest blog ”EUVL FOCUS” for magazine Solid State Technology can be read at http://www.electroiq.com/blogs/euvl-focus.html. He is widely quoted in trade media on EUVL-related topics and he is an internationally recognized expert on EUV source technology and EUV lithography. Previously, he was a Senior Member of the Technical Staff in SEMATECH’s Lithography Division. Dr. Bakshi has authored/co-authored over 125 technical publications, including book chapters, articles in peer-reviewed journals, technical reports, and trade publications. He has published four books on EUVL: EUV Sources for Lithography (SPIE Press, 2006), EUV Lithography (SPIE Press and John Wiley, 2008), Extreme Ultraviolet Lithography (SPIE Press, 2012 (co-edited with Anthony Yen), EUV Lithography - 2nd Edition (SPIE Press, February 2018). He is currently working on several additional books on the topics related to EUVL. He hold three US patents in the area of EUVL. His detailed biography and interests can be reviewed at LinkedIn (https://www.linkedin.com/in/vivek-bakshi-73a6a51/).
